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The 23rd William Blum Lecture, Material Science of Electrodeposits

Four aspects of material science pertinent to electroplating are considered in this, the text of the 23rd William Blum Lecture, presented by the 1981 recipient of the AES Scientific Achievement Award. The discussion addresses the ways in which epitaxy, twinning, dislocations and nucleation and growth of electrodeposits determine the deposit structure, which, in turn, is influenced by the deposition variables and the composition of the plating solution. The effects of structure on properties such as adhesion, brightness, corrosion resistance, ductility, electrical conductivity, hardness, internal stress, leveling capability, magnetics, strength and wear resistance are considered.

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