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The 14th William Blum Lecture, Current Distribution on Microprofiles

A survey of experimental facts and theory is given. The three types of cathodic metal distribution on microprofiles (recess/peak thickness ratio = 1, < 1, > 1) are explained. Diffusion controlled inhibition is shown to be the preponderant mechanism of the last type. Cathodic and anodic microthrowing power are compared. Roughness formation on initially smooth surfaces, and its prevention by addition agents or by modulated current, are discussed and possible brightening and leveling mechanisms other than diffusion controlled inhibition are suggested.

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